Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2011-05-17
2011-05-17
Kornakov, Michael (Department: 1714)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S034000
Reexamination Certificate
active
07942973
ABSTRACT:
A method for cleaning an electrode assembly comprising a backing plate bonded to an electrode plate for a plasma processing assembly, the method including the steps of contacting the backing plate and electrode plate with a solvent; spraying the backing plate and electrode plate with water; ultrasonically cleaning the electrode assembly; enclosing the electrode assembly in a flushing fixture defined by a base plate having a plurality of liquid passages and a cover plate configured to cover the base plate, the cover plate including at least one liquid passage; and flushing the electrode assembly in the flushing fixture by introducing a flushing liquid under pressure through said at least one liquid passage in the cover plate.
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Chinese Office Action dated May 11, 2010 in corresponding Chinese Application.
Augustino Jason
Avoyan Armen
Shih Hong
Yin Yaobo
Zhou Catherine
Buchanan & Ingersoll & Rooney PC
Golightly Eric
Kornakov Michael
Lam Research Corporation
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