Methods and apparatus for multi-exposure patterning

Details Methods and apparatus for multi-exposure patterning Methods and apparatus for multi-exposure patterning

2011-06-21

2011-06-21

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Methods

C355S053000

Reexamination Certificate

active

07965382

ABSTRACT:
In some aspects, a reticle is provided for use in forming a patterned region on a substrate using a multi-pattern, multi-exposure process. The reticle includes (a) a first pattern for the multi-pattern, multi-exposure process formed on a first region of the reticle; and (b) a second pattern for the multi-pattern, multi-exposure process formed on a second region of the reticle that is offset from first region of the reticle. Numerous other aspects are provided.

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International Search Report and Written Opinion of International Application No. PCT/US07/25158 mailed on Mar. 10, 2008.
International Preliminary Report and Written Opinion of International Application No. PCT/US07/25158 mailed on Jun. 18, 2009.

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