Methods and apparatus for material deposition using primer

Details Methods and apparatus for material deposition using primer Methods and apparatus for material deposition using primer

1996-03-05

1999-10-26

Kelly, C. H.

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427251, 427421, C23C 1600, B05D 102

Patent

active

059724285

ABSTRACT:
A liquid primer is misted, flowed into a deposition chamber and deposited on a substrate. A liquid precursor is then misted, flowed into a deposition chamber and deposited on the substrate. The primer and precursor are dried to form a solid thin film, which is then annealed to form a part of an electronic component in an integrated circuit, such as the dielectric in a memory cell. The primer is a solvent, and the precursor includes a metal carboxylate, a metal alkoxide, or a metal alkoxycarboxylate in a precursor solvent. Preferably, the primer and the precursor solvent are the same solvent, such as 2-methoxyethanol, xylenes, or n-butyl acetate.

REFERENCES:
patent: 5648114 (1997-07-01), Paz De Araujo et al.
patent: 5688565 (1997-11-01), McMillan et al.
patent: 5719417 (1998-02-01), Roeder et al.
patent: 5723171 (1998-03-01), Cuchiaro et al.
patent: 5759923 (1998-06-01), McMillan et al.
patent: 5843516 (1998-12-01), Derbenwick et al.

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