Methods and apparatus for material deposition

Details Methods and apparatus for material deposition Methods and apparatus for material deposition

1990-01-26

1992-06-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118725, 118 501, C23C 1600

Patent

active

051197600

ABSTRACT:
The present invention discloses methods and apparatus for depositing thin films of complex (compound) materials, including ferroelectrics, superconductors, and materials with high dielectric constants through a technique which is hereby entitled photo-enhanced chemical vapor deposition and activation (PECVDA). The technique involves the use of multiple heating sources including a resistive heat bias heater, a tuned optical source (UV or laser) and a source (halogen lamps or microwave sources) for applying high energy, rapid thermal pulses in a precise time sequence.

REFERENCES:
patent: 3661637 (1972-05-01), Sirtl
patent: 4489102 (1984-12-01), Olmer

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