Methods and apparatus for inspecting a sample

Details Methods and apparatus for inspecting a sample Methods and apparatus for inspecting a sample

2007-11-13

2007-11-13

Lauchman, G. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237100, C356S237500

Reexamination Certificate

active

11013976

ABSTRACT:
Disclosed are methods and apparatus for inspecting or imaging a sample, such as a semiconductor wafer or reticle. In general, an optical inspection or microscopy tool that has a complex Fourier filter positioned in the Fourier plane of the radiation beam output from the sample in response to an incident beam striking the sample is provided. Use of such Fourier filter is also disclosed. In one implementation, the complex Fourier is designed to alter a phase, and possibly amplitude, of the scattered spatial portions of the output beam relative to the specular spatial portions of the output beam so as to enhance the contrast between the two. In another implementation, the complex Fourier serves to filter the effects of repeating structures on the sample from the output beam. The complex Fourier filter is used in conjunction with a complementary illumination aperture.

REFERENCES:
patent: 5177559 (1993-01-01), Batchelder et al.
patent: 6885446 (2005-04-01), Machavariani et al.
patent: 6924893 (2005-08-01), Oldenbourg et al.
patent: 7041998 (2006-05-01), Weiss et al.
U.S. Appl. No. 11/015,852, filed Dec. 15, 2004.

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