Methods and apparatus for inducing stress in a semiconductor...

Details Methods and apparatus for inducing stress in a semiconductor... Methods and apparatus for inducing stress in a semiconductor...

2004-09-07

2008-03-04

Purvis, Sue A. (Department: 2826)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S414000, C257S418000, C257S424000, C257SE21335, C257SE29255

Reexamination Certificate

active

07339214

ABSTRACT:
Methods and apparatus are disclosed for selectively inducing stress in a semiconductor device, wherein a first region of a substrate is implanted so as to induce stress in a second region. An electrical device is formed at least partially in the second region, wherein the induced stress therein may improve one or more operational characteristics of the device, such as channel region carrier mobility.

REFERENCES:
patent: 4523213 (1985-06-01), Konaka et al.
patent: 4683637 (1987-08-01), Varker et al.
patent: 4700454 (1987-10-01), Baerg et al.
patent: 5019882 (1991-05-01), Solomon et al.
patent: 5212101 (1993-05-01), Canham et al.
patent: 5241197 (1993-08-01), Murakami et al.
patent: 5266510 (1993-11-01), Lee
patent: 5514902 (1996-05-01), Kawasaki et al.
patent: 5567629 (1996-10-01), Kubo
patent: 5683934 (1997-11-01), Candelaria
patent: 5698875 (1997-12-01), Varmazis
patent: 5712173 (1998-01-01), Liu et al.
patent: 5863827 (1999-01-01), Joyner
patent: 5882974 (1999-03-01), Gardner et al.
patent: 5882981 (1999-03-01), Rajgopal et al.
patent: 5909627 (1999-06-01), Egloff
patent: 6004871 (1999-12-01), Kittl et al.
patent: 6013546 (2000-01-01), Gardner et al.
patent: 6153920 (2000-11-01), Gossmann et al.
patent: 6214699 (2001-04-01), Joyner
patent: 6221724 (2001-04-01), Yu et al.
patent: 6228694 (2001-05-01), Doyle et al.
patent: 6261964 (2001-07-01), Wu et al.
patent: 6284626 (2001-09-01), Kim
patent: 6310367 (2001-10-01), Yagishita et al.
patent: 6426279 (2002-07-01), Huster et al.
patent: 6432798 (2002-08-01), Liu et al.
patent: 6756285 (2004-06-01), Moriceau et al.
patent: 2002/0063294 (2002-05-01), Brown et al.

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