Methods and apparatus for improving critical path analysis...

Details Methods and apparatus for improving critical path analysis... Methods and apparatus for improving critical path analysis...

2006-11-07

2006-11-07

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000, C703S014000

Reexamination Certificate

active

07134110

ABSTRACT:
Disclosed are novel methods and apparatus for efficiently providing critical path analysis of a design. In an embodiment, an apparatus disclosed can assist in creating a single critical path schematic which can be used to simulate both rising and falling edge delays. This saves time as only one schematic and one simulation is required instead of the two generally required.

REFERENCES:
patent: 5282148 (1994-01-01), Poirot et al.
patent: 6654940 (2003-11-01), Gupta

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