Methods and apparatus for forming precursors

Details Methods and apparatus for forming precursors Methods and apparatus for forming precursors

2007-10-09

2007-10-09

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

C427S561000, C204S192120, C204S298070, C204S298260, C204S298250

Reexamination Certificate

active

10471785

ABSTRACT:
This invention relates to a method of forming a precursor for chemical vapour deposition including the steps of: (a) forming metal ions at a source, (b) introducing the ions into a reaction chamber; and (c) exposing the ions to a gas or gasses within the chamber to react with the ions to form the precursor.

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