Methods and apparatus for cryogenic vacuum pumping with reduced

Refrigeration – Low pressure cold trap process and apparatus

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55269, 417901, B01D 800

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052318397

ABSTRACT:
Apparatus for vacuum pumping an enclosed chamber includes a cryopump in gas communication with the chamber for removing gases by cryocondensation and cryotrapping and an auxiliary pumping device for removing gases that are difficult to remove by cryocondensation or cryotrapping. The cryopump does not contain a sorbent material for cryosorption. As a result, the potential for contamination by a sorbent material is eliminated. The auxiliary pumping device can comprise an ion pump or a turbomolecular vacuum pump. When an ion pump is used, the ion pump is inactivated during periods of high gas loading in the chamber. The vacuum pumping apparatus is particularly useful for vacuum pumping of a plasma vapor deposition chamber.

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