Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2005-08-09
2005-08-09
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C510S257000, C134S002000, C134S003000, C438S691000
Reexamination Certificate
active
06927198
ABSTRACT:
A cleaning solution, method, and apparatus for cleaning semiconductor substrates after chemical mechanical polishing of copper films is described. The present invention includes a cleaning solution which combines deionized water, an organic compound, and a fluoride compound in an acidic pH environment for cleaning the surface of a semiconductor substrate after polishing a copper layer. Such methods of cleaning semiconductor substrates after copper CMP alleviate the problems associated with brush loading and surface and subsurface contamination.
REFERENCES:
patent: 5466297 (1995-11-01), Goodman et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 6147002 (2000-11-01), Kneer
patent: 6162301 (2000-12-01), Zhang et al.
patent: 6165956 (2000-12-01), Zhang et al.
patent: 6169034 (2001-01-01), Avanzino et al.
patent: 6274059 (2001-08-01), Krusell et al.
patent: 6294027 (2001-09-01), Li et al.
patent: 6303551 (2001-10-01), Li et al.
patent: 6479443 (2002-11-01), Zhang et al.
patent: 6593282 (2003-07-01), Li et al.
patent: 6656022 (2003-12-01), Ota et al.
patent: 6673757 (2004-01-01), Kneer
Hymes Diane J.
Krusell Wilbur C.
Zhang Liming
Zhao Yuexing
Lam Research Corporation
Martine & Penilla & Gencarella LLP
Webb Gregory
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