Method to trim and smooth high index contrast waveguide...

Optical waveguides – Planar optical waveguide

Reexamination Certificate

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C385S130000, C385S131000, C438S029000, C438S031000

Reexamination Certificate

active

11633335

ABSTRACT:
Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.

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