Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2006-06-06
2006-06-06
Deo, Duy-Vu N. (Department: 1765)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001200, C134S001300, C438S710000, C438S714000, C438S720000, C438S722000
Reexamination Certificate
active
07055532
ABSTRACT:
The process of the present invention comprises reactive ion etching of AlxFyOzoxide deposits on aluminum-containing bond pads using feed gases, such as, SF6/CF4/Ar or Cl2/BCL3/Ar. whose active plasma etches the AlxFyOzoxide deposits by physical etching and chemical etching for more complete removal of the AlxFyOzoxide deposits.
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Liu Hung-Hsin
Tsai How-Cheng
Deo Duy-Vu N.
Duane Morris LLP
Taiwan Semiconductor Manufacturing Co. Ltd.
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