Method to print photoresist lines with negative sidewalls

Details Method to print photoresist lines with negative sidewalls Method to print photoresist lines with negative sidewalls

2008-05-06

2008-05-06

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S314000, C430S319000, C430S320000

Reexamination Certificate

active

07368227

ABSTRACT:
It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons. Then, a second development treatment is given. This results in removal of additional material from the sidewalls, said removal being greatest at the substrate and least at the pedestal's top surface, resulting in negatively sloping sidewalls. Application of this method to a process for forming a pole tip for a vertical magnetic writer is also discussed.

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