Method to improve ignition in plasma etching or plasma...

Details Method to improve ignition in plasma etching or plasma... Method to improve ignition in plasma etching or plasma...

2007-10-09

2007-10-09

Tran, Binh X. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S729000, C438S733000, C438S776000, C216S071000

Reexamination Certificate

active

10957340

ABSTRACT:
In one embodiment, the present invention relates to a method for increasing the ignition reliability of a plasma in a plasma reactor, the method comprising: supplying a source gas to the plasma reactor, the source gas comprising: (a) at least one reactive compound; and (b) at least one ignition gas, wherein the at least one ignition gas increases the ignitability of the source gas as compared to the ignitability of the source gas lacking the at least one ignition gas.

REFERENCES:
patent: 5789867 (1998-08-01), Westendorp et al.
patent: 5827437 (1998-10-01), Yang et al.
patent: 5895273 (1999-04-01), Burns et al.
patent: 6087267 (2000-07-01), Dockrey et al.
patent: 6090717 (2000-07-01), Powell et al.
patent: 6228747 (2001-05-01), Joyner
patent: 6291361 (2001-09-01), Hsia et al.
patent: 6475920 (2002-11-01), Coburn et al.
patent: 6537918 (2003-03-01), Ionov et al.
patent: 6635578 (2003-10-01), Xu et al.
patent: 2003/0235987 (2003-12-01), Doshita
patent: 2004/0023508 (2004-02-01), Chinn et al.
patent: 2004/0043612 (2004-03-01), Jung
patent: 2004/0155015 (2004-08-01), Oh
patent: 2004/0209480 (2004-10-01), Su et al.
patent: 2005/0029221 (2005-02-01), Chang et al.
patent: 2005/0032386 (2005-02-01), Chang et al.
patent: 2005/0048790 (2005-03-01), Komagata

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