Method to generate airgaps with a template first scheme and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having air-gap dielectric

Reexamination Certificate

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C257SE21564, C257SE21573, C257SE21581

Reexamination Certificate

active

07863150

ABSTRACT:
A structure and method to produce an airgap on a substrate having a dielectric layer with a pattern transferred onto the dielectric layer and a self aligned block out mask transferred on the dielectric layer around the pattern.

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