Method to form self-aligned gate structures and focus rings

Details Method to form self-aligned gate structures and focus rings Method to form self-aligned gate structures and focus rings

1992-03-02

1993-02-16

Seidel, Richard K.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, H01J 904

Patent

active

051866706

ABSTRACT:
A selective etching and chemical mechanical planarization process for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays in which the emission tip is i) optionally sharpened through oxidation, ii) deposited with a first conformal layer, iii) deposited with a conductive material layer, iv) deposited with a second conformal insulating layer, v) deposited with a focus electrode ring material layer, vi) optionally deposited with a buffering material, vii) planarized with a chemical mechanical planarization (CMP) step, to expose a portion of the second conformal layer, viii) etched to form a self-aligned gate and focus ring, and thereby expose the emitter tip, afterwhich xi) the emitter tip may be coated with a low work function material.

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