Method to form self-aligned gate structures and focus rings

Details Method to form self-aligned gate structures and focus rings Method to form self-aligned gate structures and focus rings

1994-09-06

1997-08-05

Bradley, P. Austin

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 49, 445 50, H01J 902, H01J 130

Patent

active

056536194

ABSTRACT:
A selective etching and chemical mechanical planarization process is employed for the formation of self-aligned gate and focus ring structures surrounding an electron emission tip for use in field emission displays. The process is employed to construct an emission grid whereby the gate structure is capable of producing a field strength at the cathode tip sufficient to generate electron emission. The gate is disposed at a location above the tip such that the gate physically intercepts the outermost lateral portions of the beam, yet does not induce a significant electrostatic outward divergence of the beam, thereby reducing the cross-section of the beam.

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