Method to form a photovoltaic cell comprising a thin lamina

Details Method to form a photovoltaic cell comprising a thin lamina Method to form a photovoltaic cell comprising a thin lamina

2008-09-11

2010-11-30

Brewster, William M (Department: 2823)

Semiconductor device manufacturing: process

Semiconductor substrate dicing

C438S459000, C438S507000, C438S458000, C438S455000, C438S057000, C257SE21001, C257SE31001

Reexamination Certificate

active

07842585

ABSTRACT:
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.

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