Method to detect photoresist residue on a semiconductor device

Details Method to detect photoresist residue on a semiconductor device Method to detect photoresist residue on a semiconductor device

2007-04-17

2007-04-17

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C257SE21024, C257SE21527

Reexamination Certificate

active

10842178

ABSTRACT:
A method for detecting photoresist residue during semiconductor device manufacture includes developing photoresist on a surface of a semiconductor device to expose portions of the surface A plurality of etch paths are then partially etched into the surface and inspected to determine their depths.

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