Method to control a management system to control...

Details Method to control a management system to control... Method to control a management system to control...

2006-11-14

2006-11-14

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S005000, C438S010000, C438S011000, C438S017000, C438S018000, C216S061000, C216S071000

Reexamination Certificate

active

07135412

ABSTRACT:
In the control method in a management system of semiconductor manufacturing equipment to enhance a product yield through a control of etching process, information of a corresponding lot for the etching process is recognized. It is checked whether the information of corresponding lot is for an etching process after a predetermined RF time of etching apparatus. RF time of the etching apparatus is compared with the predetermined RF time, and it is decided whether the etching process of corresponding lot can be performed in the etching apparatus if the etching process for the corresponding lot should be performed after a lapse of the predetermined RF time.

REFERENCES:
patent: 5569356 (1996-10-01), Lenz et al.
patent: 6197699 (2001-03-01), Fritzinger et al.
patent: 6939476 (2005-09-01), Griffin
patent: 6983191 (2006-01-01), Mikata

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