Method to change the profiles of released membranes

Details Method to change the profiles of released membranes Method to change the profiles of released membranes

2007-03-20

2007-03-20

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

Reexamination Certificate

active

10952757

ABSTRACT:
A method to change the profile of released membranes is disclosed. This method is to form an island structure at certain regions of membranes. Membranes comprise one or several layers of different materials, and at least one layer has intrinsic or residual stress. The profile of membrane will change from being flat to curved at the region of island structure when membranes are released from sacrificial layers.

REFERENCES:
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patent: 7057251 (2006-06-01), Reid
patent: 2003/0031221 (2003-02-01), Wang et al.
patent: 2004/0066258 (2004-04-01), Cohn et al.
patent: 2004/0252936 (2004-12-01), Despont et al.
patent: 2005/0130360 (2005-06-01), Zhan et al.
patent: 2005/0226281 (2005-10-01), Faraone et al.

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