Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-07-17
2007-07-17
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192110, C427S130000
Reexamination Certificate
active
10693276
ABSTRACT:
A method for making a spin valve includes providing a substrate; depositing a first ferromagnetic layer having a first surface on the substrate; depositing a spacer layer having a second surface; depositing a second ferromagnetic layer, wherein the spacer layer is disposed between the first and second ferromagnetic layers; and exposing one or more of the first and second surfaces to an oxygen partial pressure, then decreasing the oxygen partial pressure before depositing a subsequent layer. One or more of the first and second surfaces may be exposed to an oxygen partial pressure of between about 1×10−7Torr and about 5×10−5Torr.
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W.F. Egelhoff, et al., “Oxygen as a Surfactant in the Growth of Giant Magnetoresistance Spin Valves,” J. Appl. Phys., vol. 82, No. 12, pp. 6142-6151, 1997.
International Business Machines - Corporation
McDonald Rodney G.
Zilka-Kotab, PC
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