Method, system, apparatus and program for programming defect...

Details Method, system, apparatus and program for programming defect... Method, system, apparatus and program for programming defect...

2004-05-05

2008-10-21

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C356S237100, C382S144000, C382S149000

Reexamination Certificate

active

07441226

ABSTRACT:
A program defect condition is input to a defect-data programming apparatus which programs defect data for evaluation of a reticle inspection apparatus, thereby generating program defect information, program-defect-information-free source CAD data is converted to CAD data of a format with which the CAD data is input to the reticle inspection apparatus, and the program defect information is embedded into the converted CAD data, thereby generating program-defect-information-present CAD data for inspection apparatus. The program-defect-information-present CAD data for inspection apparatus is input to the reticle inspection apparatus together with a program-defect-information-free reticle produced based on the program-defect-information-free source CAD data, for execution of sensitivity evaluation. Program defect information needed to execute sensitivity evaluation of the reticle inspection apparatus is generated on that CAD data which is input to the reticle inspection apparatus, not on a real reticle.

REFERENCES:
patent: 6466314 (2002-10-01), Lehman
patent: 6873720 (2005-03-01), Cai et al.
patent: 7133548 (2006-11-01), Kenan et al.
patent: 7254251 (2007-08-01), Cai et al.
patent: 2003/0086081 (2003-05-01), Lehman
patent: 2000-258349 (2000-09-01), None
patent: 2002-048722 (2002-02-01), None

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