Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1985-08-26
1987-10-27
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430325, 430326, 430327, 430328, 430394, 430494, 430966, 430967, G03C 500, G03C 504
Patent
active
047029951
ABSTRACT:
A method of lithography employing an electromagnetic wave having a very short wave length such as X-ray and a resist layer sensitive to that electromagnetic wave is disclosed. The irradiation process is divided into two steps. One step is selectively irradiating the electromagnetic wave, as in the prior art, to the resist layer in a desired pattern. The other steps is non-selective irradiation over the entire area of the resist layer. The latter step may be conducted with a plurality of workpieces such as semiconductor wafers simultaneously.
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Kittle John E.
NEC Corporation
Ryan Patrick J.
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