Method of verifying photomask data based on models of etch...

Details Method of verifying photomask data based on models of etch... Method of verifying photomask data based on models of etch...

2007-07-20

2010-12-07

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07849423

ABSTRACT:
A photomask dataset corresponding to a target-pattern is verified by simulating a resist-pattern that will be formed in a resist layer by a lithography process, simulating an etched-pattern that will be etched in a layer by a plasma process wherein said simulation comprises calculating a flux of particles impacting a feature, and determining whether the etched-pattern substantially conforms to the target-pattern.

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