Method of vapor-depositing strip-shaped substrates with a...

Details Method of vapor-depositing strip-shaped substrates with a... Method of vapor-depositing strip-shaped substrates with a...

2003-10-16

2009-06-02

Meeks, Timothy H (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C428S469000, C204S192260

Reexamination Certificate

active

07541070

ABSTRACT:
The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

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English language abstract of DE 198 45 268.

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