Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging radiant energy exposure
Patent
1988-01-22
1989-11-21
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging radiant energy exposure
430326, G03C 516
Patent
active
048822639
ABSTRACT:
Ultraviolet radiation process applies to manufacture to semiconductor devices in order to enhance the thermal stability of the developed positive photoresist film on semiconductor's wafers.
A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatmnent of the positive photoresist employing ultraviolet irradiation by preventing the deformation of the positive photoresist which is caused by the light radiated form the microwave-excited electrodeless discharge lamp. These method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the developed positive photoresist image placed under lower or pressure than 1 atmospheric pressure, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the positive photoresist out of radiant lights obtained from the microwave-excited electrodeless discharge lamp.
REFERENCES:
patent: 4548688 (1985-10-01), Matthews
patent: 4749436 (1988-06-01), Minato et al.
Matthews et al, "Stabilzation of Single Layer and Multilayer Resist Patterns . . . " Fusion Semiconductor Systems, SPIE Conf., Optical Microlithography 111, Calif., Mar. 14-15, 1984.
UV Hardening of Photo and Electron Beam Resist Patterns, J. Va. Scl. Technol., 19(4), Nov./Dec. 1981.
High Temperature Flow Resistance of Micron Sized Images in AZ Resists H. Hiraoka and J. Pacansky, IBM Research Laboratory, San Jose, Calif.
Deep U.V. Hardening of Positive Photoresist Patterns Journal of the Electrochemical Society, Jun. 1982.
Stabilization of Single Layer and Multilayer Resist Patterns to Aluminum Etching Environments, Fusion Semiconductor Systems, Mar. 1984.
Deep UV Hardening of Photo- and Electron Resist Patterns 1984 Dry Process Symposium, Matsushita Electronics Corporation.
Double Exposure Stabilization of Positive Photoresist Journal of Applied Polymer Science, Vo. 30, 547-555 (1985).
Arai Tetsuji
Mimura Yoshiki
Suzuki Hiroko
Suzuki Shinji
Ueki Kazuyoshi
Dees Jos,e G.
Usho Denki
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