Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging radiant energy exposure
Patent
1988-01-26
1989-06-20
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging radiant energy exposure
430330, G03C 536
Patent
active
048408760
ABSTRACT:
An ultraviolet radiation method of treating positive photoresist materials to enhance the thermal stability of positive photoresist film on a semiconductor wafer employing heating and ultraviolet irradiation. The process improves the heat-resistance and plasma-resistance of the photoresist image. The initial heating temperature of the photoresist is set to be a little higher than the initial flow temperature of the photoresist, and the temperature of the developed positive photoresist image is raised in proportion as the flow temperature of said photoresist image is increased by exposing the photoresist placed in gas of a lower atmospheric pressure to ultraviolet radiation and/or heating.
REFERENCES:
patent: 4548688 (1985-10-01), Matthews
patent: 4749436 (1988-06-01), Minato et al.
Maron et al., Fundamentals of Physical Chemistry, 1974, Chap. 17, pp. 737 and 739, "Effect of Temperature on Photochemical Reactions".
Yanazawa et al., "Double Exposure Stabilization of Positive Photoresist", Journal of Applied Polymer Science, vol. 30, pp. 547-555 (1985).
Takasu et al., "Deep UV Hardening of Photo- and Electron Resist Patterns", Dry Process Symposium, pp. 60-65 (1984).
Matthews et al., "Stabilization of Single Layer and Multilayer Resist Patterns to Aluminum Etching Environments", (1984).
Hiraoka et al., (A), "High Temperature Flow Resistance of Micron Sized Images in AZ Resists", J. Electrochem. Soc.: Solid-State Science and Technology, Dec. 1981, pp. 2645-2647.
Allen et al., "Deep UV Hardening of Positive Photoresist Patterns", Journal of the Electrochemical Society, Jun. 1982, pp. 1379-1381.
Hiraoka et al., (B), "UV Hardening of Photo- and Electron Resist Patterns", J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1132-1135.
Dees Jos,e G.
Ushio Denki
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