Method of treating active material

Details Method of treating active material Method of treating active material

1993-07-19

1996-07-09

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118723R, 118723E, 118724, 118725, 118730, C23C 1618, C23C 1646, C23C 1648

Patent

active

055340695

ABSTRACT:
An active substance treating method is characterized in that an active substance is caused to react with an inactivating substance in an exhaust system for a thin film forming apparatus. A thin film forming apparatus includes a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, a device provided in the chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 .mu.m or above to heat the substrate, an introducing port for separately introducing two active substances to a vicinity of the substrate, a vaporizing device in which at least two bubblers are series-connected to vaporize the active substances, and an exhaust system which is divided into two systems each of which has a heater and which has a port for introducing an inactivating substance into an exhaust pump.

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