Method of treating a mask layer prior to performing an...

Details Method of treating a mask layer prior to performing an... Method of treating a mask layer prior to performing an...

2006-08-07

2009-08-11

Culbert, Roberts (Department: 1792)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C438S711000

Reexamination Certificate

active

07572386

ABSTRACT:
A method of pre-treating a mask layer prior to etching an underlying thin film is described. A thin film, such as a dielectric film, is etched using plasma that is enhanced with a ballistic electron beam. In order to reduce the loss of pattern definition, such as line edge roughness effects, the mask layer is treated with an electron beam in the absence of an atomic halogen specie prior to proceeding with the etching process.

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