Abrading – Abrading process – Abradant supplying
Reexamination Certificate
2005-06-28
2005-06-28
Hail, III, Joseph J. (Department: 3723)
Abrading
Abrading process
Abradant supplying
C451S036000, C451S037000, C451S041000, C451S087000, C451S091000, C451S099000, C451S287000, C451S446000
Reexamination Certificate
active
06910954
ABSTRACT:
A computer-controlled slurry supplying apparatus for providing abrasive slurry to a chemical mechanical polishing (CMP) machine in a semiconductor manufacturing process preferably comprises a storage portion for accepting and storing a quantity of undiluted slurry, a mixing portion for accepting undiluted slurry from the storage portion and mixing with a diluting solution to created a diluted slurry, a supply portion for holding the diluted slurry, and at least one point-of-use mixing unit for mixing at least one chemical additive to the diluted slurry at or near a dispensing nozzle at the point of application. Each of the above portions of the slurry supplying apparatus further includes a re-circulation means for keep solutions in a mixed and agitated state. A method for using the slurry supplying apparatus comprises steps of controllably operating various valves, pumps, and sensors to maintain a desired slurry composition and flow rate.
REFERENCES:
patent: 5478435 (1995-12-01), Murphy et al.
patent: 5957759 (1999-09-01), Cardenas et al.
patent: 6059920 (2000-05-01), Nojo et al.
patent: 6338671 (2002-01-01), Kawashima et al.
patent: 6406364 (2002-06-01), Kimura et al.
patent: 6457852 (2002-10-01), Hiraoka et al.
patent: 2000-202774 (2000-07-01), None
Ahn Seung-Hoon
Chae Seung-Ki
Kim Seung-Un
Kim Sue-Ryeon
Lee Je-Gu
Hail III Joseph J.
Lee, Sterba & Morse P.C.
McDonald Shantese
Samsung Electronics Co,. Ltd.
LandOfFree
Method of supplying slurry and a slurry supply apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of supplying slurry and a slurry supply apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of supplying slurry and a slurry supply apparatus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3485135