Fluent material handling – with receiver or receiver coacting mea – Processes
Reexamination Certificate
2006-06-13
2006-06-13
Douglas, Steven O. (Department: 3751)
Fluent material handling, with receiver or receiver coacting mea
Processes
C141S094000, C141S192000, C137S487500, C137S486000
Reexamination Certificate
active
07059363
ABSTRACT:
A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q1/Q2accurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q1/Q2from a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FV1and FV2are provided in the plurality of branch supply lines GL1and GL2. Opening control of both division quantity controllers FV1and FV2is started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P3′ and P3″ on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q1+Q2of gas while dividing into the chamber C through orifice holes (3a,4a) made in shower plates (3, 4) at desired division quantities Q1and Q2represented by formulas Q1=C1P3′ and Q2=C2P3″ (where, C1and C2are constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).
REFERENCES:
patent: 6848470 (2005-02-01), Ohmi et al.
patent: 6934643 (2005-08-01), Kar et al.
patent: 8-64490 (1996-03-01), None
patent: 08338546 (1996-12-01), None
patent: 11063265 (1999-03-01), None
patent: 2000-305630 (2000-11-01), None
International Search Report, completed Mar. 28, 2003 of PCT/JP03/00437.
Dohi Ryosuke
Ikeda Nobukazu
Nishino Kouji
Sugiyama Kazuhiko
Uenoyama Toyomi
Douglas Steven O.
Fujikin Incorporated
Griffin & Szipl, P.C.
Tokyo Electron Ltd.
LandOfFree
Method of supplying divided gas to a chamber from a gas... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of supplying divided gas to a chamber from a gas..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of supplying divided gas to a chamber from a gas... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3689188