Method of stripping layers of organic materials

Details Method of stripping layers of organic materials Method of stripping layers of organic materials

1990-09-06

1991-08-06

Bueker, Richard

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, H01L 2100

Patent

active

050375067

ABSTRACT:
Gaseous sulfur trioxide is used to remove various organic coatings, polymerized photoresist, and especially implant and deep-UV hardened photoresist layers, during the manufacture of semiconductor or ceramic devices.

REFERENCES:
patent: 4520046 (1985-05-01), McCaskie et al.
patent: 4778536 (1988-10-01), Grebinsri

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