Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-02-25
2000-02-29
Gibson, Sharon
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430394, 430396, G03F 720
Patent
active
060307528
ABSTRACT:
A method of stitching segments defined by adjacent image patterns of a photolithographic system during the manufacture of a semiconductor device is disclosed. The method includes forming a material over a semiconductor substrate, projecting a first image pattern over the substrate that defines a first segment and a contact region, projecting a second image pattern over the substrate that defines a second segment with an end that overlaps the contact region, and removing a portion of the material corresponding to the first and second image patterns to form the first and second segments stitched by a portion of the contact region. The contact region has a greater width than the first and second segments. In this manner, the contact region accommodates misalignments that might otherwise lead to inadequate coupling or decoupling between the first and second segments. The invention is particularly well-suited for stitching polysilicon gates of N-channel and P-channel devices.
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Dawson Robert
Fulford Jr. H. Jim
Gardner Mark I.
Hause Frederick N.
Michael Mark W.
Advanced Micro Devices , Inc.
Gibson Sharon
Holloman Jill N.
Holloway William W.
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