Method of stabilizing oxide etch and chamber performance...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With mechanical mask – shield or shutter for shielding workpiece

Reexamination Certificate

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C438S706000, C438S905000, C134S001200, C134S001300, C156S345350

Reexamination Certificate

active

06899785

ABSTRACT:
Undesirable reactions (such as formation of volatile compounds or complexes) are recognized to occur during production processes (such as etching with fluorine) at interior surfaces of a reactor chamber (such as a silicon-based reactor chamber). These undesirable reactions may be minimized and controlled by priming the chamber surface by incorporating seasoning atoms and/or molecules.

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