Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1998-07-14
1999-11-16
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419215, 20429823, 20429827, C23C 1432
Patent
active
059851058
ABSTRACT:
A protective overcoat with improved corrosion resistance is sputter deposited on a magnetic thin film medium to effectively cover and seal the side walls of high aspect ratio roughness features. During sputter deposition, the disk is rotated about a y axis of an x-y plane and spun in the x-y plane while sputtering particles are impinged in a direction substantially along a z-axis perpendicular to the x-y plane. Embodiments include simultaneous or intermittent disk rotation and spinning. The sputtering technique is applicable to depositing corrosion resistance protective overcoats on thin film magnetic recording media and magneto-optical media.
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Cantelmo Gregg
Nguyen Nam
Seagate Technology Inc.
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