Method of sputtering an amorphous carbon overcoat as a protectiv

Details Method of sputtering an amorphous carbon overcoat as a protectiv Method of sputtering an amorphous carbon overcoat as a protectiv

1997-11-05

1999-02-23

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, C23C 1435

Patent

active

058739840

ABSTRACT:
A thin-film magnetic recording media is prepared which contains a carbon overcoat sputtered on a magnetic recording layer. The carbon overcoat is sputtered on the magnetic recording layer using a sputtering process which is conducted in a sputtering chamber having an inert gas and a mixture of nitrogen gas and hydrogen gas, wherein said nitrogen gas and hydrogen gas are provided at a mole ratio of nitrogen/hydrogen between about 0.5 and about 1. The hydrogen and nitrogen doped amorphous carbon overcoat exhibits excellent mechanical properties and tribological performance.

REFERENCES:
patent: 5679431 (1997-10-01), Chen et al.

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