Method of smoothening dielectric layer

Details Method of smoothening dielectric layer Method of smoothening dielectric layer

2005-08-23

2009-12-22

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S723000, C438S724000, C438S787000, C438S791000, C438S694000, C257SE21240

Reexamination Certificate

active

07635651

ABSTRACT:
A method of smoothening a dielectric layer. First, a substrate is provided. Next, a dielectric layer is formed on the semiconductor substrate. Finally, the dielectric layer is smoothened by a plasma treatment employing a silane based gas and a nitrogen based gas.

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