Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-07-12
2008-12-23
Chowdhury, Tarifur R. (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07468795
ABSTRACT:
A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.
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European Search Report issued in EP 06 11 6659 dated Nov. 27, 2006.
Megens Henricus Johannes Lambertus
Mos Everhardus Cornelis
Simons Hubertus Johannes Gertrudus
Verhoeven Henricus Jacobus Maria
Verstappen Leonardus Henricus Marie
Akanbi Isiaka O
ASML Netherlands B.V.
Chowdhury Tarifur R.
Pillsbury Winthrop Shaw & Pittman LLP
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