Method of reviewing detected defects

Details Method of reviewing detected defects Method of reviewing detected defects

2005-11-15

2005-11-15

Pharma, Hou Q. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

C356S394000

Reexamination Certificate

active

06965429

ABSTRACT:
A method to solve the problem of a technique generally used to detect a defect of a semiconductor by calculating the differential image based on pattern matching, which requires that a reference image must be picked up to pick up an image of the inspection position in an area with the semiconductor pattern having no periodicity, resulting in a low throughput. The image of the inspection position is divided into local areas, each local area is matched with the local area of the image already stored and the difference between the local areas thus matched is determined to extract area.

REFERENCES:
patent: 5298963 (1994-03-01), Moriya et al.
patent: 5659172 (1997-08-01), Wagner et al.
patent: 5750990 (1998-05-01), Mizuno et al.
patent: 5943437 (1999-08-01), Sumie et al.
patent: 6067153 (2000-05-01), Mizuno
patent: 6222935 (2001-04-01), Okamoto
patent: 6333992 (2001-12-01), Yamamura et al.
patent: 6476388 (2002-11-01), Nakagaki et al.
patent: 6567168 (2003-05-01), Nara et al.
patent: 09280845 (1997-10-01), None
patent: 2000-067243 (2000-03-01), None
patent: 2000-195458 (2000-07-01), None

Affiliated with

Also associated with

Rating

Method of reviewing detected defects does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of reviewing detected defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of reviewing detected defects will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3512121