Method of removing photosensitive resin and photosensitive resin

Details Method of removing photosensitive resin and photosensitive resin Method of removing photosensitive resin and photosensitive resin

1995-04-27

1998-08-11

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566461, H01L 21302

Patent

active

057923140

ABSTRACT:
A photosensitive resin removing method is capable of completely removing a photosensitive resin employed as a photoresist in an etching process for etching an aluminum film, and its derivatives and of improving the durability of a photosensitive resin removing apparatus for carrying out the method. A mixed gas is produced by mixing fluorine compound gas and steam, the mixed gas is excited with microwaves, and the photosensitive resin is exposed to the excited mixed gas to gasify the photosensitive resin.

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Resist and Sidewall Film Remoral after AI Reactive Ion Etching (RIE) Employing F+H.sub.2 O Downstream Ashing. Jpn. Phys. vol. 32 (1993) pp. 3045-3050 Part 1, No. 6B, Jun. 1993.

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