Method of removing photo-resist

Details Method of removing photo-resist Method of removing photo-resist

1998-01-22

2000-11-28

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

134 38, 510176, G03C 500

Patent

active

061533602

ABSTRACT:
A method of removing photo-resist. Acetone, thinner, and deionized water for scrubbing a wafer are used to clean a wafer on which a photo-resist layer is formed, so that thinner and deionized water are mutually dissolvable with acetone as medium. The photo-resist layer is then removed.

REFERENCES:
patent: 4965010 (1990-10-01), Swett
patent: 4992108 (1991-02-01), Ward et al.
patent: 5091103 (1992-02-01), Dean et al.
patent: 5155175 (1992-10-01), Mercer et al.
patent: 5171393 (1992-12-01), Moffat
patent: 5268260 (1993-12-01), Bantu et al.
patent: 5626913 (1997-05-01), Tomoeda et al.
patent: 5728664 (1998-03-01), Michelotti
patent: 5997658 (1999-12-01), Peters et al.
McGraw-Hill Dictionary of Chemistry, 1997, McGraw-Hill, NY, p. 173.

Affiliated with

Also associated with

Rating

Method of removing photo-resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of removing photo-resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of removing photo-resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1723551