Method of removing etch residues

Details Method of removing etch residues Method of removing etch residues

2006-04-04

2006-04-04

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S704000, C438S718000

Reexamination Certificate

active

07022612

ABSTRACT:
Organic etch residues are often left within vias formed by etching through resist masks. Since the etch is designed to expose an underlying metal layer and is directional in order to produce vertical via sidewalls, the residue often incorporates metal. The present invention discloses a method of removing such etch residues while passivating exposed metal, including exposing the residue to ammonia. In the disclosed embodiment, ammonia and oxygen are mixed in a plasma step, such that the resist can be burned off at the same time as the residue treatment. The residue can thus be easily rinsed away.

REFERENCES:
patent: 5017265 (1991-05-01), Park et al.
patent: 5174856 (1992-12-01), Hwang et al.
patent: 5200031 (1993-04-01), Latchford et al.
patent: 5228950 (1993-07-01), Webb et al.
patent: 5269878 (1993-12-01), Page et al.
patent: 5281850 (1994-01-01), Kanamori et al.
patent: 5310626 (1994-05-01), Fernandes et al.
patent: 5358599 (1994-10-01), Cathey et al.
patent: 5514247 (1996-05-01), Shan et al.
patent: 5545289 (1996-08-01), Chen et al.
patent: 5661083 (1997-08-01), Chen et al.
patent: 5667630 (1997-09-01), Lo
patent: 5783459 (1998-07-01), Suzuki et al.
patent: 5811022 (1998-09-01), Savas et al.
patent: 5814156 (1998-09-01), Elliott et al.
patent: 5849367 (1998-12-01), Dixit et al.
patent: 5849639 (1998-12-01), Molloy et al.
patent: 5977041 (1999-11-01), Honda
patent: 5986344 (1999-11-01), Subramanion et al.
patent: 6613681 (2003-09-01), Hillyer et al.
patent: WO 93/17453 (1993-09-01), None

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