Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-04-05
2005-04-05
Goodrow, John L (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S270110, C430S302000, C355S067000
Reexamination Certificate
active
06875545
ABSTRACT:
A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
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S. Manakli et al., “Complementary Double Exposure Technique (CODE): a way to print 80nm gate level using a double exposure binary mask approach”, XP-02257320, Optical Microlithography XV, SPIE, vol. 4691, (2002), pp. 491-502.
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N. Kachwala et al., “Imaging contrast improvement for 160nm line features using sub resolution assist features with binary, 6% temary attenuated phase shift mask with process tuned resist”, XP-002257322, pp. 55-67.
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Chen Jang Fung
Eurlings Markus Franciscus Antonius
Hsu Duan-Fu Stephen
ASML Masktools B.V.
Goodrow John L
McDermott Will & Emery LLP
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