Method of reducing surface damage in KTP optical waveguides

Details Method of reducing surface damage in KTP optical waveguides Method of reducing surface damage in KTP optical waveguides

1989-09-14

1991-05-14

Straub, Gary P.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG71, 156DIG75, 156DIG81, 156625, 156628, 350 9612, 350 9615, 350 963, 134 2216, 134 26, 437225, C30B 1912

Patent

active

050153285

ABSTRACT:
A method for producing an optical waveguide which comprises imersing a wafer of K.sub.1-x Rb.sub.x TiOMO.sub.4, wherein 0.ltoreq.x.ltoreq.1, and M is P or As, for 1-64 hours in molten potassium nitride at 400.degree.-500.degree. C., followed by washing and immersing in a molten salt of Rb, Cs, or Tl at 240.degree.-335.degree. C., thereby causing the Rb, Cs, or Tl to replace the K or Rb cations. The resultant product has reduced mechanical damage to the waveguide surface.

REFERENCES:
patent: 3949323 (1976-04-01), Bierlein et al.
patent: 4740265 (1988-04-01), Bierlein et al.
patent: 4766954 (1988-08-01), Bierlein et al.

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