Method of reducing particulate contaminants in a chemical-vapor-

Details Method of reducing particulate contaminants in a chemical-vapor- Method of reducing particulate contaminants in a chemical-vapor-

1993-12-03

1995-03-14

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

118719, C23C 1600

Patent

active

053975960

ABSTRACT:
In a chemical-vapor-deposition system, a method of reducing particulate contamination within a reaction chamber. In general, the chemical-vapor-deposition system contains a gas inlet conduit which connects a reaction chamber to a reactive gas source and a gas outlet conduit which connects the reaction chamber to a vacuum pump. The vacuum pump facilitates exhausting gas from the reaction chamber. The method of reducing particulate contamination in the system includes the steps of: filling, via said inlet conduit, the reaction chamber with a reactive gas; exhausting the reactive gas from the reaction chamber using the vacuum pump; isolating the reaction chamber from the vacuum pump to cease exhausting the chamber; backfilling, via the inlet conduit, the reaction chamber with the reactive gas; and preventing, during the backfilling step, generation of eddy currents in a portion of the outlet conduit by providing a particle restrictor within the outlet conduit. To prevent the eddy currents that could cause particulate contaminants to enter the chamber from the outlet conduit, the particle restrictor contains a baffle that extends transversely across the outlet conduit.

REFERENCES:
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patent: 4807562 (1989-02-01), Sandys
patent: 4834022 (1989-05-01), Mahawili
patent: 4838201 (1989-06-01), Fraas et al.
patent: 4992044 (1991-02-01), Philipossian
patent: 5038711 (1991-08-01), Dan et al.

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