Method of reactive ion etching molybdenum and molybdenum silicid

Details Method of reactive ion etching molybdenum and molybdenum silicid Method of reactive ion etching molybdenum and molybdenum silicid

1984-02-28

1984-10-23

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 1566591, 204192E, 252 791, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

044786786

ABSTRACT:
The method of reactive ion etching molybdenum or molybdenum silicide includes the steps of placing a sample to be etched on one of two opposed electrodes in a vacuum chamber, charging an etching gas into the chamber, applying high frequency electrical power to the electrodes to generate a discharge between them, and etching the exposed portion of the sample. The gas is a mixture of chlorine and oxygen, with the oxygen flow rate being less than about 30% of the total flow rate of the mixture.

REFERENCES:
patent: 4411734 (1983-10-01), Maa
patent: 4444617 (1984-04-01), Whitcomb

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