Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1991-11-22
1992-11-10
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430311, 430312, G03C 1112
Patent
active
051621940
ABSTRACT:
Method of providing a printed circuit board with a cover coat on a selected area thereof characterized by the steps of:
REFERENCES:
patent: 4889790 (1989-12-01), Roos et al.
IBM Technical Disclosure Bulletin, vol. 19, No. 12, May 1977, p., 4539 by Abolafia et al, "Dual Density Mask For Photoresist".
IBM (TDB) vol. 19, No. 12, May 1977, P. A. Hartley, Dual Density Mask for Photoresist (4540).
IBM (TDB) vol. 22, No. 3, Aug. 1979, Hampson, R. A., Miller, E. D., Journal Take-Up Roll for Printer Mechanism.
International Business Machines
McCamish Marion E.
Rosasco S.
Tiegerman Bernard
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