Method of providing a pattern of apertures and/or cavities in a

Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly

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H01J 902

Patent

active

058002316

ABSTRACT:
A method of providing a plurality of cavities and/or apertures in a plate or layer wherein, after the plate or layer has been provided with a mask having a plurality of apertures arranged in a pattern, at least one jet of abrasive powder particles is moved relative to the plate. On its exposed surface, the mask is provided with a coating which prevents substantial mechanical stresses from being generated in the mask during the process by the jet of powder particles.

REFERENCES:
patent: 4898557 (1990-02-01), Engemann
patent: 5347201 (1994-09-01), Liang et al.

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