Method of production of multilayer ceramic electronic device

Details Method of production of multilayer ceramic electronic device Method of production of multilayer ceramic electronic device

2006-05-02

2006-05-02

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S663000, C438S662000

Reexamination Certificate

active

07037831

ABSTRACT:
A method of production of a multilayer ceramic capacitor or other multilayer ceramic electronic device with few structural defects and improved highly accelerated life, that is, a method of production of a multilayer ceramic electronic device having a firing step of firing a stack comprised of a dielectric layer paste and an internal electrode layer paste including a base metal alternately arranged in a plurality of layers, a first annealing step of annealing, at a temperature T1of 600 to 900° C., the stack after firing and a second annealing step of annealing, at a temperature T2of 900 to 1200° C. (however, excluding 900° C.), the stack after said first annealing.

REFERENCES:
patent: 5336532 (1994-08-01), Haluska et al.
patent: 6510040 (2003-01-01), Sato et al.
patent: A 08-008137 (1996-01-01), None
patent: A 2002-080279 (2002-03-01), None

Affiliated with

Also associated with

Rating

Method of production of multilayer ceramic electronic device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of production of multilayer ceramic electronic device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of production of multilayer ceramic electronic device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3576275